Optical system alignment, tolerancing, and verification, XIV: 21 August 2022, San Diego, California, United States

Surface damage catalog for contact-measuring space flight optics using a coordinate measuring machine / Joshua Berrier; Timothy Hahn; David Kubalak; S. Bradley Cenko; Javier Del Hoyo; Severine Tournois; Raymond Ohl -- PACE OCI short-wave infrared detection assembly optical system design, alignment, and environmental test / James Champagne; Dallin Brailsford; Roy Esplin; Jacob Hedelius; Trent Newswander; James Peterson; Tyrel Rupp; Kenneth Squire; Eric Gorman; Emily Kan; D. Brent Mott; Luis Ramos-Izquierdo; Joe Thomes; Ulrik Gliese -- Using image symmetries to uniquely align aspheric mirrors to a focus and axis / Robert E. Parks -- Impact of the LCD monitor locations on a novel alignment method: the combination of deflectometry and the sine condition test / Hyemin Yoo; Matthew Dubin -- Flat target method: mitigation of errors in quad target method / Rupert S. Cooper; Matthew E. L. Jungwirth -- Bifocal autocollimation head for simultaneous tilt and shift determination in multi-element lenses for ultra-precision 5D adhesive bonding / Christian Wilde; Patrik Langehanenberg -- Automated real-time optical detection system used for laser alignment analysis / F. Girard -- Optomechanical analysis of compliant spacers in passively athermalized drop-in optical systems / Martin Tangari Larrategui; Victor E. Densmore III; Lee Johnson; Christian Baker; Matthew Hevert; Bianka Camacho; Paul Tulungen; Peter McNiven; Kate Medicus; Kenneth R. Castle; Tilman W. Stuhlinger -- An optical apparatus to enable absolute angular alignment for sampling-based MTF test equipment / Teresa Zhang; Jiang He; Wei Zhou -- A self-adaptive calibration tool for periscope of AR/VR glass binocular disparity measurement / Jiang He; Wei Zhou; Pengfei Wu -- Pose estimation of optical resonators using convolutional neural networks in a simulation environment / Nils Melchert; Kolja Hedrich; Leon Wiese; Lennart Hinz; Eduard Reithmeier -- Exploiting wafer level packaging of VCSELs on silicon photonic integrated circuits (PICs) with the advantages of a novel, flip-chip bonding, active dry-alignments method on SOI up-reflecting mirrors (Conference Presentation) / Giovanni Delrosso -- How to use manufacturing statistics when tolerancing a lens system / Morris I. Kaufman; Robert M. Malone; Daniel K. Frayer; Gavin O. Griffin; Brandon B. Light -- Integrated opto-mechanical tolerance analysis / Frédéric Lamontagne; Nathalie Blanchard; Simon Paradis; Nichola Desnoyers -- Powerful standalone application for realistic optical tolerancing / Nathalie Blanchard; Frédéric Lamontagne; Simon Paradis; Nichola Desnoyers -- Analyzing error sources and error propagation in an optical scanning 3D triangulation sensor system / Johannes Schlarp; Ernst Csencsics; Georg Schitter -- Exact wavefront refracted through separated doublet lenses considering an incident plane wavefront / Ismael Velázquez-Gómez; Maximino Avendaño-Alejo; Martín Jiménez-Rodríguez; María C. López-Bautista -- Off-axis alignment based on optical three-dimension rendering for compact adaptive optics scanning laser ophthalmoscope / Hang Chan Jo; Robert J. Zawadzki; Dae Yu Kim -- Machine vision system for alignment in die-to-wafer bonder / Jiyoung Chu; Minhwan Seo; Hyungjin Kim; Wondon Joo; Sungmin Ahn; Sangwoo Bae -- On-the-fly optimization of synchrotron beamlines using machine learning / T. W. Morris; M. Rakitin; A. Giles; J. Lynch; A. L. Walter; B. Nash; D. Abell; P. Moeller; I. Pogorelov; N. Goldring.